OverviewSpecificationsApplicationsTheoryVideosossila"sUVOzoneCleaneriscapableofremovingcontaminationonthesurfaceofsamples,providingyouwithultracleansurfaceswithinminutes.Byusingahigh-powerUVlightsource,ozoneisgenerated-whichthenbreaksdownsurfacecontaminantsintovolatilecompounds.Thesevolatilecompoundsevaporatefromthesurfaceleavingnotrace.Thismethodcanproducenear-atomicallycleansurfaceswithoutcausingdamagetothesample.HighIntensityUVLightSourceSimpletouseInterfaceLargeCleaningAreaTheOssilaUVOzoneCleanerPreviousNextFeatures   HighIntensityUVLamp TheUVOzoneCleanerhousesahighintensitylowpressuremercuryvapourdischargelamp.Byutilizingtheemissionat185nmand254nmozonecanbegenerated.ThepresenceofozoneandUVlightallowfortheremovaloforganicsandsterilizesthesurface. LargeCleaningArea TheIlluminationareais100mmby100mmthisallowsforthecleaningofawidearrayofsamplesincluding:MicroscopeSlides4-InchWaferAFMTipsDicedSubstratesPetriDishesAndMore SimpletouseInterface TheBrightdisplayandtactilekeypadprovideasimpleinterface,alongsidetheeasytousesoftwareitonlytakesashorttimetostartcleaningyoursamples.Inadditiontheinbuiltsoftwaremonitorsthetemperatureinsidethesystem,thisallowsyoutomakesuredelicatesamplesdonotoverheat. AddedSafety Ossila"sUVOzonecleanerhasbeendesignedwithsafetyinmind.AdheringtoBSEN61010-1:2010standardsalongsideEMC,LowVoltageandRoHSCEdirective.Thesystemprovidesuserswithaddedreassurancethattheequipmenttheyareusinghasbeenbuiltwithbothqualityandsafetyinmind. TheOssilaGuarantee Ossilaaimtohelpsimplifyresearchthatiswhywegiveafree2yearwarrantyonourequipment.Inadditionweofferrapiddispatchofitems,freeshippingonmanyorders,anddiscountsforlargepurchases.Ontopofthisweprovideexpertsupport,tutorials,andarangeofinformativeguides.FreeShippingInformationFreeShippingAvailableWithOnlineCheckoutorUpfrontPayments.OnlyappliestocountrieswithsimplifiedcustomsprocedureswhereFedEx,DHL,orUPScandeliverasnormal,asoutlinedinthetablebelow. DestinationStandardShippingRateFreeShippingUK£6.99FREEforordersviaonlinecheckoutorupfrontpaymentover£100USAandCanada£24.91FREEforordersviaonlinecheckoutorupfrontpaymentover£200EU/EEA£30.79FREEforordersviaonlinecheckoutorupfrontpaymentover£250Asia-Pacific:onlyAustralia,HongKong,Japan,Malaysia,NewZealand,Singapore,SouthKorea,Taiwan,Thailand,Vietnam£45.27FREEforordersviaonlinecheckoutorupfrontpaymentover£400DiscountsonLargeOrdersWearegratefulforthecontinuedsupportofourloyalcustomers.Thisletsusknowthatwearedoingthingsright,andthatourproductsmeetyourresearchneeds.Toshowourappreciation,wenowprovidean8%discountforallordersabove8,000GBPanda10%discountforallordersaboveatotalof10,000GBP.WhataretheusesofUVOzoneCleaningUVOzonecleaningseesawiderangeofusesacrossmultipledisciplines,thetwomainusesforthetechniqueareforsurfacecleaningandsurfacetreatment.SurfacecleaningusingUVozonecleaningistypicallydoneasafinalstepinacleaningproceduretoremoveresidualorganicsthatarepresentonthesurfaceofasample.Theprocessresultsinanatomicallycleansurfacefreeformanyorganiccontaminants. SurfacetreatmentusingUVOzoneisalsoapopularapplicationofthistechnique.DuringthecleaningprocesstheformationofozoneandoxygenrADIcalscanresultinreactionwithwatermoleculespresentintheair.Thisresultsintheformationofhydroxideradicals.Thesevaryshortlivedhighlyreactivespeciescanreactwithbondsonthesurfaceofsubstratesresultingintheformationofhighenergyhydroxidegroups.Thiscanhelpwithpreparationofsamplesbyincreasingthesurfaceenergyofasubstrate. TherearealsootherapplicationsofUVOzonecleaningsuchassurfacesterilization,UVcuring,UVchemicalreactions,andmuchmore.FormoreinformationonthedifferentapplicationsanddetailedexamplesofhowUVOzonecleaningcanbeusedpleaseseeourapplicationstab HowdoesUVOzoneCleaningWork?UVOzonecleaningreliesupontheuseofahigh-intensityUVlightsourcewhichilluminatesthesurfacetobecleanedwithtwospecificwavelengthsoflight.Lowpressuremercuryvapourdischargelampsaretypicallyusedwhichhavetwodominantemissionpeaksat184nmand254nm.Uponirradiationmolecularoxygenpresentwithinairisdissociatedbyradiationbelow200nminlength.Thisresultsintheformationoftworadicalsofoxygen.Theseradicalsgoontoreactwithfurthermolecularoxygenformingmoleculesofozone. Atthesametimelightat254nmisusedtoexciteorganicspeciespresentonthesurfaceofthesample.Thisprocessincreasesthereactivityofthecontaminantswithozone.Uponreactingthematerialiscleanedfromthesurface.FormoreinformationonthecleaningprocessandalsohowUVozonecleaningcanalterthesurfaceenergyofsubstratepleaseseeourtheorytabonthispage.SpecificationsUVlamptypeSyntheticQuartzUVGridLampUVlampdominantwavelengths185nmand254nmUVlampdimensions100mmx100mmUVlampcurrent30mA(constant)254nmoutputintensity20µW/cm2atdistanceof100cmUVlamplifetimeT80(2000hours);8-10yearsofstandarddailyusePowersupplyMains220-240VACFusedat1AOptionalAC/ACAdapter110V/230VMaxruntime59minutes59secondsSafetyfeaturesSafetyinterlock,Hightemperaturewarning,thermalcutoutSubstratetraysize100mmx100mmMaximumrecommendedsubstratesize100mmx100mmOverallDimensionsWidth204mmHeight227mmDepth300mm*PleasenotethatthisUVOzoneCleanerdoesNOThaveanintegratedozonefiltrationsystem,andmustthereforebeoperatedinaworkingfumehood.DatasheetsUVLampSpectrum(Graphofrelativeintensityofemissionspectrum)UVLampLifetime(Graphofrelativeintensityoveroperationaltimeinhours)ComplianceDocumentsDeclarationofConformance(LowVoltageDirective,EMCDirective,RoHSDirective,andBSEN61010-1:2010)UserManualUserManualGeneralApplicationsUVOzonecleaningisaversatiletechnique,itcanbeappliedtoawidearrayofmaterialstoprovidesurfacecleaningandtreatment.ItcanalsobeusedforavarietyofotherapplicationswhichrequireeitherthepresenceofozoneorUVlight.BelowisalistofcommonmaterialsthatcanbetreatedusingUVozonecleaning:Quartz/GlassSilicon/SiliconOxidesMetals(e.gGold,Silver,Steel)TransparentConductors(ITO,FTO,IZO,AZO)MetalOxides(e.gAluminiumOxide,TitaniumOxide)III-VSemiconductors(e.gGalliumArsenide,SiliconNitride)AFM/STMProbesOpticalComponentsIfyouwouldliketoknowifyourmaterialissuitableforusewithUVOzonecleaningpleasefeelfreetocontactusatinfo@ossila.com.UVOzonecleaningisaversatiletechniquenotonlycanitbeusedacrossawidearrayofmaterialsbutitcanalsobeusedtoperformavarietyofdifferenttasks.BelowisalistofsomeofthecommonapplicationsofUVOzonetreatment:SurfacecleaningUVcuringSurfacesterilizationUVchemicalreactionsSurfaceTreatmentRemovalofsurfacemonolayersOxidationofsurfacesMicropatterningApplicationNotes RemovalofSurfaceMonolayersandImprovingSurfaceHydrophilicity InthisapplicationweusedtheUVozonecleanertoremoveasurfacelayerofn-octadecyltrichlorosilane(OTS)toimprovethewettingofwater-basedsolutionsonasiliconsubstrate.OTSisanorganicmoleculewhichisusedinthefabricationoforganicfieldeffecttransistorstoimprovetheelectricalpropertiesofdepositedfilms.OTSconsistsofatrichlorosilanegroupwhichreactswiththenativeoxideofsilicontoformthreesiloxanebondswiththesurface.ThesebondsrepeatacrossthesurfaceofthesiliconsubstrateuntiltheentiresurfaceiscoveredinamonolayerofOTS.Thelonghydrocarbonchainswhicharepresentresultinthesubstratehavingaverylowsurfaceenergy.Moleculeofn-octadecyltrichlorosilane(OTS).Wettingofhighsurfaceenergysolvents,suchaswater,becomeimpossIBLeandthecontactangleofdepositeddropletsarethereforehigh.TheOTStreatedsubstratewasexposedtoUVozoneforapproximately10minutestocleanthesurfaceoftheoctadecanecarbonchains.BelowisanimageofawaterdropletpresentonthesurfaceofanOTStreatedsiliconsubstrateandanimageofadropletaftertreatment.Thetreatmenthasincreasedthesurfaceenergyenoughtoallowcompletewettingofthewaterdropletonthesubstratessurface.WaterdroponOTS-treatedsiliconsubstrate(300nmSiO2onsurface)beforeUVozonecleaning(left)andafter10minutesUVozonecleaning(right).SurfaceTreatmentofPMMASubstratestoReduceContactAnglePlasticssubstrateshaveverylowsurfaceenergyduetotheabundanceofC-Hbondsandothersimilarlowenergybonds.Coatingthinfilmsfromsolutionsthathavehighsurfacetensionsolventscanbedifficultduetothepoorwettingthatoccurs.Onemethodtoassessthedegreeofwettingistolookatthecontactangleadropletmakesonthesurfaceoftehsusbtrate.Thelwoerthecontactanglethataparticularsovlentmakesthebetterthewettingit.UVozonecleaningcanbeusedtotreatthesurfacetoimprovethewettingofsolvents.DuringtheprocessofUVozonetreatmentozonereactswithsurfacebondsbreakingdowntheorganicgroupsandeventuallyreleasingvolatilespecies.DuringtheprocessintermediatestepsoccurinwhichlowenergybondssuchastheC-HbondarereplacedwithhigherenergygroupssuchasC-OH.Thebelowfigureshowshowsurfacetreatmentcanbeusedtoimprovethesurfaceenergyofasubstrateandthatthelengthofexposuretoozonecanvarythedegreeofsurfaceenergychange.ContactanglemeasuremetnsofwatertakenonPMMAsubstratesaftervaryinglengthsofUVOzoneexposuretime.HowDoesUVOzoneCleanSamples? UVozonecleaningisaphoto-sensitizedoxidationprocessinwhichorganicmoleculesintheirexcitedstatechemicallyreactwithozonemoleculesresultinginthecleavingofbondsandthedissociationofmoleculesfromthesurface.TheprocessutilizesahighintensityUVlightsourcewhichhastwodominantemissionpeaksat185nmand254nm.Thesetwowavelengthsareresponsiblefordifferentprocesseswhichultimatelyresultinthecleaningofthesurface.Figure1.Videoshowingtheprocessofozoneformationandphoto-sensitizedoxidationoforganiccontaminants.Radiationbelow200nmisstronglyabsorbedbymolecularoxygen,theenergyoftheabsorbedphotonisenoughtobreaktheoxygen-oxygendoublebondresultingintheformationoftwofreeradicalsofoxygen(O•).Thesefreeradicalscansubsequentlyreactwithmolecularoxygenproducingozonemolecules(O3).UVradiationat254nmisreadilyabsorbedbyorganicspeciesthatarepresentonthesurfaceofmanysubstrates.Theexcitonthatisformedwillbeinahighlyenergeticstate,theenergymayalsobehighenoughforcertainmoleculestomakeorganicradicals.Theexcitedstatesandorganicradicalspeciespresentonthesurfacereadilyreactwithozonepresentwithintheatmosphereresultingintheformationofvolatilespeciessuchascarbondioxide,water,molecularnitrogen,andshortchainorganiccompounds.Thesevolatilecompoundscaneasilydesorbfromthesurfaceunderatmosphericconditionsresultinginapristinesurface.HowDoesUVOzoneAlterSurfaceEnergy?UVOzonetreatmentaltersthesurfaceenergyofsamplesviatwomethods,thefirstoftheseisthroughtheremovaloflowenergycontaminantsfromthesurface.Thesearetypicallyorganicatmosphericcontaminantsthathaveadsorbedontothesurfaceofasubstrate.Thesecondwayisthroughtreatmentofthesurfaceandtheformationofhighenergybondsonthesurfaceofthesamples.Theremovalofcontaminantsisdoneviathephoto-oxidationprocess,thisprocessresultsinthedesorptionofcontaminantsfromthesurfaceduetothechemicalbreakdownoftheorganicmaterial.Theunderlyingsubstrateistypicallyahigherenergysurfacesuchasaceramicorametalthisresultsinthesurfaceenergyofthesampleincreasingincomparisontowhenitwasuntreated.Thistreatmentdoesnotlastforeverasovertimeorganiccontaminantswillbegintoreabsorbbackontothesurfaceslowlydecreasingthesurfaceenergy.ThesecondwaythatUVOzonetreatmentworkstoimprovethesurfaceenergyisviatheformationofhydroxylfunctionalgroupsonthesurfaceofthesubstrate.Duringtheirradiationprocesslightat253.7nmcanbreakdownwatermoleculesresultingintheformationofOHandOfreeradicals.HydroxylfreeradicalswilltypicallyreactwithozonepresenttoformwaterandOxygen,howeverwhentheUVdegradationofwateroccursnearthesurfaceofthesamplethehydroxylfreeradicalcanreactwiththesurfaceformingafunctionalgroup.Thisfunctionalgrouphasahighbondingenergyresultinginanincreaseinthesurfaceenergyofmostsurfaces.Formoreinformationonthetheoryofsurfaceenergyandhowtocalculatesurfaceenergiespleasevisitoursurfaceenergyguidepage. RelatedProducts SpinCoaterL2001A3£1995CompactSpinCoaterVacuumfreespincoating,nomorepumpsornitrogenlines.Thesmallfootprintisperfectforbusygloveboxesandfumehoods.MoreInfo  Substrates £18-£549VariousTypesAwiderangeofsubstratesforthinfilmdeposition.Includingquartz,ITO,FTO,silicon,sapphire,andmore...SeeCollection  ContactAngleL2004A1£1500RapidDropAnalysisHighresolutionimagescombinedwithfreeanalysissoftwareallowforprecisewettinganglemeasurements.MoreInfo  Tothebestofourknowledgethetechnicalinformationprovidedhereisaccurate.However,OssilaassumenoliABIlityfortheaccuracyofthisinformation.Thevaluesprovidedherearetypicalatthetimeofmanufactureandmayvaryovertimeandfrombatchtobatch.

关于奥西拉

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Ossila由有机电子研究科学家于2009年成立，旨在提供组件，设备和材料，以实现智能，高效的科学研究和发现。十多年来，我们很自豪能向全球80多个国家/地区的1000多个不同机构提供产品。

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